Series resistance optimization of high-sensitivity Si-based VUV photodiodes

L Shi; LK Nanver; A Sakic; T Knezevic; S Nihtianov; A Gottwald; U Kroth

doi:10.1109/IMTC.2011.5944073

Series resistance optimization of high-sensitivity Si-based VUV photodiodes

L Shi, LK Nanver, A Sakic, T Knezevic, S Nihtianov, A Gottwald, U Kroth

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

6 Citations (Scopus)

Original language	English
Title of host publication	2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC)
Editors	H Zhang, K Lee, Y Yan, R Dyer
Place of Publication	Piscataway, NJ, USA
Publisher	IEEE Society
Pages	1-4
Number of pages	4
ISBN (Print)	978-1-4244-7935-1
DOIs	https://doi.org/10.1109/IMTC.2011.5944073
Publication status	Published - 2011
Event	2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC) - Piscataway, NJ, USA Duration: 10 May 2011 → 12 May 2011

Publication series

Name
Publisher	IEEE

Conference

Conference	2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC)
Period	10/05/11 → 12/05/11

Keywords

Conf.proc. > 3 pag

Access to Document

10.1109/IMTC.2011.5944073

Cite this

@inproceedings{60142fa543404a6586a6964127702089,

title = "Series resistance optimization of high-sensitivity Si-based VUV photodiodes",

keywords = "Conf.proc. > 3 pag",

author = "L Shi and LK Nanver and A Sakic and T Knezevic and S Nihtianov and A Gottwald and U Kroth",

year = "2011",

doi = "10.1109/IMTC.2011.5944073",

language = "English",

isbn = "978-1-4244-7935-1",

publisher = "IEEE Society",

pages = "1--4",

editor = "H Zhang and K Lee and Y Yan and R Dyer",

booktitle = "2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC)",

note = "2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC) ; Conference date: 10-05-2011 Through 12-05-2011",

}

Shi, L, Nanver, LK, Sakic, A, Knezevic, T, Nihtianov, S, Gottwald, A & Kroth, U 2011, Series resistance optimization of high-sensitivity Si-based VUV photodiodes. in H Zhang, K Lee, Y Yan & R Dyer (eds), 2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC). IEEE Society, Piscataway, NJ, USA, pp. 1-4, 2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC), 10/05/11. https://doi.org/10.1109/IMTC.2011.5944073

Series resistance optimization of high-sensitivity Si-based VUV photodiodes. / Shi, L; Nanver, LK; Sakic, A et al.

2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC). ed. / H Zhang; K Lee; Y Yan; R Dyer. Piscataway, NJ, USA : IEEE Society, 2011. p. 1-4.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Series resistance optimization of high-sensitivity Si-based VUV photodiodes

AU - Shi, L

AU - Nanver, LK

AU - Sakic, A

AU - Knezevic, T

AU - Nihtianov, S

AU - Gottwald, A

AU - Kroth, U

PY - 2011

Y1 - 2011

KW - Conf.proc. > 3 pag

U2 - 10.1109/IMTC.2011.5944073

DO - 10.1109/IMTC.2011.5944073

M3 - Conference contribution

SN - 978-1-4244-7935-1

SP - 1

EP - 4

BT - 2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC)

A2 - Zhang, H

A2 - Lee, K

A2 - Yan, Y

A2 - Dyer, R

PB - IEEE Society

CY - Piscataway, NJ, USA

T2 - 2011 IEEE Instrumentation and Measurement Technology Conference (I2MTC)

Y2 - 10 May 2011 through 12 May 2011

ER -