Si-supported mesoporous and microporous oxide interconnects as electrophoretic gates for application in microfluidic devices

R Schmuhl, W Nijdam, J Sekulic, SR Chowdhury, CJM van Rijn, A van den Berg, JE ten Elshof, DHA Blank

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{2fcbd3268d8c4962b7d97ff0e45c6a54,

title = "Si-supported mesoporous and microporous oxide interconnects as electrophoretic gates for application in microfluidic devices",

keywords = "ZX CWTS 1.00 <= JFIS < 3.00",

author = "R Schmuhl and W Nijdam and J Sekulic and SR Chowdhury and {van Rijn}, CJM and {van den Berg}, A and {ten Elshof}, JE and DHA Blank",

year = "2005",

language = "Undefined/Unknown",

volume = "77",

pages = "178--184",

journal = "Analytical Chemistry",

issn = "0003-2700",

publisher = "American Chemical Society (ACS)",

}

TY - JOUR

T1 - Si-supported mesoporous and microporous oxide interconnects as electrophoretic gates for application in microfluidic devices

AU - Schmuhl, R

AU - Nijdam, W

AU - Sekulic, J

AU - Chowdhury, SR

AU - van Rijn, CJM

AU - van den Berg, A

AU - ten Elshof, JE

AU - Blank, DHA

PY - 2005

Y1 - 2005

KW - ZX CWTS 1.00 <= JFIS < 3.00

M3 - Article

SN - 0003-2700

VL - 77

SP - 178

EP - 184

JO - Analytical Chemistry

JF - Analytical Chemistry

ER -