Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

AM Nugrowati, SF Pereira, JJM Braat

Research output: Contribution to journalArticleScientificpeer-review

Original languageUndefined/Unknown
Pages (from-to)00-00
Number of pages1
JournalJournal of Applied Physics
Issue number00
Publication statusPublished - 2009


  • professional journal papers
  • CWTS 0.75 <= JFIS < 2.00

Cite this