Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

C Biasotto, JA Diniz, AM Daltrini, SA Moshkalev, MJR Monteiro

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)7777-7782
Number of pages6
JournalThin Solid Films
Issue number21
Publication statusPublished - 2008


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