Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor

GJ Schoof, CR Kleijn, HEA van den Akker, TGM Oosterlaken, H.J.M.C. Terhorst, F. Huussen

    Research output: Contribution to journalArticleScientificpeer-review

    2 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)51-61
    Number of pages11
    JournalThe European Physical Journal. Special Topics
    Issue numberPr4
    Publication statusPublished - 2002


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