Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace

GJ Schoof; CR Kleijn; TGM Oosterlaken; F. Huussen; H.J.M.C. Terhorst

Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace

GJ Schoof, CR Kleijn, TGM Oosterlaken, F. Huussen, H.J.M.C. Terhorst

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Proceedings of the ASME 4th International Symposium on Computational Technologies for Fluid/Thermal/Structural/Chemical Systems with Industrial Applications
Editors	C.R. Kleijn, S. Kawano
Publisher	ASME
Pages	101-112
Number of pages	12
ISBN (Print)	0-7918-4659-8
Publication status	Published - 2002

Publication series

Name
Publisher	ASME

Name
Volume	PVP-448-1

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Cite this

Schoof, GJ., Kleijn, CR., Oosterlaken, TGM., Huussen, F., & Terhorst, H. J. M. C. (2002). Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace. In C. R. Kleijn, & S. Kawano (Eds.), Proceedings of the ASME 4th International Symposium on Computational Technologies for Fluid/Thermal/Structural/Chemical Systems with Industrial Applications (pp. 101-112). ASME.

@inproceedings{cbd38ad38ec748dcbb8465f93bf8a845,

title = "Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "GJ Schoof and CR Kleijn and TGM Oosterlaken and F. Huussen and H.J.M.C. Terhorst",

year = "2002",

language = "Undefined/Unknown",

isbn = "0-7918-4659-8",

publisher = "ASME",

pages = "101--112",

editor = "C.R. Kleijn and S. Kawano",

booktitle = "Proceedings of the ASME 4th International Symposium on Computational Technologies for Fluid/Thermal/Structural/Chemical Systems with Industrial Applications",

address = "United States",

}

Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace. / Schoof, GJ; Kleijn, CR; Oosterlaken, TGM et al.
Proceedings of the ASME 4th International Symposium on Computational Technologies for Fluid/Thermal/Structural/Chemical Systems with Industrial Applications. ed. / C.R. Kleijn; S. Kawano. ASME, 2002. p. 101-112.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace

AU - Schoof, GJ

AU - Kleijn, CR

AU - Oosterlaken, TGM

AU - Huussen, F.

AU - Terhorst, H.J.M.C.

PY - 2002

Y1 - 2002

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 0-7918-4659-8

SP - 101

EP - 112

BT - Proceedings of the ASME 4th International Symposium on Computational Technologies for Fluid/Thermal/Structural/Chemical Systems with Industrial Applications

A2 - Kleijn, C.R.

A2 - Kawano, S.

PB - ASME

ER -