Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process

V Rana; R Ishihara; Y Hiroshima; D Abe; S Inoue; T Shimoda; JW Metselaar; CIM Beenakker

Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process

V Rana, R Ishihara, Y Hiroshima, D Abe, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE)
Editors	W Krautschneider, C Claeys
Place of Publication	Utrecht
Publisher	STW Technology Foundation
Pages	662-665
Number of pages	4
ISBN (Print)	90-73461-43-X
Publication status	Published - 2004
Event	7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, the Netherlands - Utrecht Duration: 25 Nov 2004 → 26 Nov 2004

Publication series

Name
Publisher	STW Technology Foundation

Conference

Conference	7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, the Netherlands
Period	25/11/04 → 26/11/04

Keywords

Vakpubl., Overig wet. > 3 pag

Cite this

Rana, V., Ishihara, R., Hiroshima, Y., Abe, D., Inoue, S., Shimoda, T., Metselaar, JW., & Beenakker, CIM. (2004). Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process. In W. Krautschneider, & C. Claeys (Eds.), Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE) (pp. 662-665). STW Technology Foundation.

@inproceedings{8a57c41f3e884491bc89aa7d2b718133,

title = "Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process",

keywords = "Vakpubl., Overig wet. > 3 pag",

author = "V Rana and R Ishihara and Y Hiroshima and D Abe and S Inoue and T Shimoda and JW Metselaar and CIM Beenakker",

year = "2004",

language = "Undefined/Unknown",

isbn = "90-73461-43-X",

publisher = "STW Technology Foundation",

pages = "662--665",

editor = "W Krautschneider and C Claeys",

booktitle = "Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE)",

note = "7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, the Netherlands ; Conference date: 25-11-2004 Through 26-11-2004",

}

Rana, V, Ishihara, R, Hiroshima, Y, Abe, D, Inoue, S, Shimoda, T, Metselaar, JW & Beenakker, CIM 2004, Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process. in W Krautschneider & C Claeys (eds), Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE). STW Technology Foundation, Utrecht, pp. 662-665, 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, the Netherlands, 25/11/04.

Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process. / Rana, V; Ishihara, R; Hiroshima, Y et al.
Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE). ed. / W Krautschneider; C Claeys. Utrecht: STW Technology Foundation, 2004. p. 662-665.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

TY - GEN

T1 - Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process

AU - Rana, V

AU - Ishihara, R

AU - Hiroshima, Y

AU - Abe, D

AU - Inoue, S

AU - Shimoda, T

AU - Metselaar, JW

AU - Beenakker, CIM

PY - 2004

Y1 - 2004

KW - Vakpubl., Overig wet. > 3 pag

M3 - Conference contribution

SN - 90-73461-43-X

SP - 662

EP - 665

BT - Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE)

A2 - Krautschneider, W

A2 - Claeys, C

PB - STW Technology Foundation

CY - Utrecht

T2 - 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE), Veldhoven, the Netherlands

Y2 - 25 November 2004 through 26 November 2004

ER -