Single-crystalline Si thin film transistors with electron cyclotron resonance plasma enhanced chemical vapor deposited gate SiO2

R Ishihara; BD van Dijk; PC van der Wilt; JW Metselaar; CIM Beenakker; Y Hiroshima; D Abe; S Higashi; S Inoue; T Shimoda

Single-crystalline Si thin film transistors with electron cyclotron resonance plasma enhanced chemical vapor deposited gate SiO2

R Ishihara, BD van Dijk, PC van der Wilt, JW Metselaar, CIM Beenakker, Y Hiroshima, D Abe, S Higashi, S Inoue, T Shimoda

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	EURODISPLAY 2002 proceedings
Place of Publication	s.l.
Publisher	s.n.
Pages	407-409
Number of pages	3
ISBN (Print)	2-9507804-3-1
Publication status	Published - 2002
Event	EURODIPLAY 2002, Nice, France - s.l. Duration: 2 Oct 2002 → 4 Oct 2002

Publication series

Name
Publisher	s.n.

Conference

Conference	EURODIPLAY 2002, Nice, France
Period	2/10/02 → 4/10/02

Bibliographical note

cpk

Keywords

Elektrotechniek
Techniek
Geen BTA classificatie

Cite this

@inproceedings{fed5724045ee4901ac073acf9365e331,

title = "Single-crystalline Si thin film transistors with electron cyclotron resonance plasma enhanced chemical vapor deposited gate SiO2",

keywords = "Elektrotechniek, Techniek, Geen BTA classificatie",

author = "R Ishihara and {van Dijk}, BD and {van der Wilt}, PC and JW Metselaar and CIM Beenakker and Y Hiroshima and D Abe and S Higashi and S Inoue and T Shimoda",

note = "cpk; EURODIPLAY 2002, Nice, France ; Conference date: 02-10-2002 Through 04-10-2002",

year = "2002",

language = "Undefined/Unknown",

isbn = "2-9507804-3-1",

publisher = "s.n.",

pages = "407--409",

booktitle = "EURODISPLAY 2002 proceedings",

}

Single-crystalline Si thin film transistors with electron cyclotron resonance plasma enhanced chemical vapor deposited gate SiO2. / Ishihara, R; van Dijk, BD; van der Wilt, PC et al.
EURODISPLAY 2002 proceedings. s.l.: s.n., 2002. p. 407-409.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Single-crystalline Si thin film transistors with electron cyclotron resonance plasma enhanced chemical vapor deposited gate SiO2

AU - Ishihara, R

AU - van Dijk, BD

AU - van der Wilt, PC

AU - Metselaar, JW

AU - Beenakker, CIM

AU - Hiroshima, Y

AU - Abe, D

AU - Higashi, S

AU - Inoue, S

AU - Shimoda, T

N1 - cpk

PY - 2002

Y1 - 2002

KW - Elektrotechniek

KW - Techniek

KW - Geen BTA classificatie

M3 - Conference contribution

SN - 2-9507804-3-1

SP - 407

EP - 409

BT - EURODISPLAY 2002 proceedings

PB - s.n.

CY - s.l.

T2 - EURODIPLAY 2002, Nice, France

Y2 - 2 October 2002 through 4 October 2002

ER -