Single-Step CMOS Compatible Fabrication of High Aspect Ratio Microchannels Embedded in Silicon

INIS

• aspect ratio 100%
• fabrication 100%
• silicon 100%
• substrates 66%
• etching 66%
• design 33%
• width 33%
• actuators 33%
• masks 33%
• dimensions 33%
• processing 33%
• ions 33%
• tuning 33%
• sensors 33%
• length 33%
• depth 33%

Material Science

• Silicon 100%
• Electronic Component 33%
• Actuator 33%
• Reactive Ion Etching 33%
• Sensor 33%

Engineering

• Silicon Substrate 40%
• Electronics 20%
• Processing 20%
• Design Parameter 20%
• Deep Reactive Ion Etching 20%
• Process Parameter 20%