SiOFx and SiO2 deposition in an ECR-HDP reactor: Tool characterisation and film analysis

AJ Kalkman, DJ de Boer, H Fukuda, JBC van de Hilst, GCAM Janssen, S Radelaar

    Research output: Contribution to journalArticlepeer-review

    Original languageUndefined/Unknown
    Pages (from-to)271-276
    Number of pages6
    JournalMicroelectronic Engineering
    Volume38
    Publication statusPublished - 1997

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