TY - JOUR
T1 - Size-Controlled and Sintering-Resistant Sub-3 nm Pt Nanoparticles on Graphene by Temperature-Variation Atomic Layer Deposition
AU - Van Bui, Hao
AU - Kulkarni, Sri Sharath
AU - van Ommen, J. Ruud
N1 - Green Open Access added to TU Delft Institutional Repository as part of the Taverne amendment. More information about this copyright law amendment can be found at https://www.openaccess.nl. Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.
PY - 2025
Y1 - 2025
N2 - Noble metal nanoparticles (NPs), particularly platinum (Pt), are widely used in heterogeneous catalysis due to their exceptional activity. However, controlling their size and preventing sintering during synthesis remains a major challenge, especially when aiming for high dispersion and stability on supports such as graphene. Atomic layer deposition (ALD) has emerged as a promising method to address these issues, yet conventional processes often lead to broad particle size distributions (PSDs). This work introduces a new approach for the deposition of size-controlled and sintering-resistant Pt NPs on graphene by atmospheric-pressure ALD using MeCpPtMe3and O2. In this approach, the deposition temperature varies in a cyclic manner in accordance with the Pt precursor and the O2exposure steps. In every ALD cycle, the MeCpPtMe3exposure is carried out at either 150 or 200 °C, and the O2exposure is at room temperature. The room-temperature step hinders the diffusion and coalescence of Pt NPs, resulting in significantly narrower PSDs compared to those achieved by the conventional ALD processes at 150 and 200 °C. Importantly, Pt NPs with narrower PSDs exhibit higher catalytic activity and improved stability, which are demonstrated for the propene oxidation reaction, despite having a significantly lower Pt loading. Our approach may open a new avenue toward the size-selection synthesis of noble metal NPs for catalytic applications.
AB - Noble metal nanoparticles (NPs), particularly platinum (Pt), are widely used in heterogeneous catalysis due to their exceptional activity. However, controlling their size and preventing sintering during synthesis remains a major challenge, especially when aiming for high dispersion and stability on supports such as graphene. Atomic layer deposition (ALD) has emerged as a promising method to address these issues, yet conventional processes often lead to broad particle size distributions (PSDs). This work introduces a new approach for the deposition of size-controlled and sintering-resistant Pt NPs on graphene by atmospheric-pressure ALD using MeCpPtMe3and O2. In this approach, the deposition temperature varies in a cyclic manner in accordance with the Pt precursor and the O2exposure steps. In every ALD cycle, the MeCpPtMe3exposure is carried out at either 150 or 200 °C, and the O2exposure is at room temperature. The room-temperature step hinders the diffusion and coalescence of Pt NPs, resulting in significantly narrower PSDs compared to those achieved by the conventional ALD processes at 150 and 200 °C. Importantly, Pt NPs with narrower PSDs exhibit higher catalytic activity and improved stability, which are demonstrated for the propene oxidation reaction, despite having a significantly lower Pt loading. Our approach may open a new avenue toward the size-selection synthesis of noble metal NPs for catalytic applications.
UR - http://www.scopus.com/inward/record.url?scp=105016607060&partnerID=8YFLogxK
U2 - 10.1021/acs.langmuir.5c03532
DO - 10.1021/acs.langmuir.5c03532
M3 - Article
C2 - 40924995
AN - SCOPUS:105016607060
SN - 0743-7463
VL - 41
SP - 25658
EP - 25666
JO - Langmuir
JF - Langmuir
IS - 37
ER -