Some recent developments in chemical vapor deposition process and equipment modelling.

CR Kleijn, KJ Kuijlaars, M Okkerse-Ruitenberg, H van Santen, HEA van den Akker

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	117-132
Number of pages	16
Journal	The European Physical Journal. Special Topics
Volume	9
Issue number	Pr8
Publication status	Published - 1999

Cite this

@article{4b6acd38bc924f48ba82ae1ad53fde34,

title = "Some recent developments in chemical vapor deposition process and equipment modelling.",

author = "CR Kleijn and KJ Kuijlaars and M Okkerse-Ruitenberg and {van Santen}, H and {van den Akker}, HEA",

year = "1999",

language = "Undefined/Unknown",

volume = "9",

pages = "117--132",

journal = "The European Physical Journal. Special Topics",

issn = "1155-4339",

publisher = "EDP Sciences",

number = "Pr8",

}

TY - JOUR

T1 - Some recent developments in chemical vapor deposition process and equipment modelling.

AU - Kleijn, CR

AU - Kuijlaars, KJ

AU - Okkerse-Ruitenberg, M

AU - van Santen, H

AU - van den Akker, HEA

PY - 1999

Y1 - 1999

M3 - Article

SN - 1155-4339

VL - 9

SP - 117

EP - 132

JO - The European Physical Journal. Special Topics

JF - The European Physical Journal. Special Topics

IS - Pr8

ER -