Some recent developments in chemical vapor deposition process and equipment modelling.

CR Kleijn, KJ Kuijlaars, M Okkerse-Ruitenberg, H van Santen, HEA van den Akker

    Research output: Contribution to journalArticleScientificpeer-review

    1 Citation (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)117-132
    Number of pages16
    JournalThe European Physical Journal. Special Topics
    Issue numberPr8
    Publication statusPublished - 1999

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