Statistical MOSFET Modeling Methodology for Cryogenic Conditions

Aykut Kabaoglu*, Nergiz Sahin Solmaz, Sadik Ilik, Yasemin Uzun, Mustafa Berke Yelten

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

21 Citations (Scopus)

Abstract

Conventional transistor models are unable to capture the electrical behavior of transistors at cryogenic temperatures. In this paper, a methodology has been developed to calibrate temperature dependence parameters of Berkeley Short-Channel Insulated Gate Field Effect Transistor Model (BSIM3). Rather than modifying BSIM3 equations, the algorithm only changes the values of relevant parameters through noniterative, analytic operations; therefore, it can be implemented in typical circuit simulation tools. Proposed methodology allows to estimate ID-VGS and ID-VDS curves of the transistors having different channel lengths and widths even under various operating voltages, including the body bias. The parameter extraction algorithm runs with a reasonable computation cost and can compute parameter sets for transistors at user-defined cryogenic conditions.

Original languageEnglish
Article number8550668
Pages (from-to)66-72
Number of pages7
JournalIEEE Transactions on Electron Devices
Volume66
Issue number1
DOIs
Publication statusPublished - 2019
Externally publishedYes

Keywords

  • BSIM modeling
  • cryogenic
  • cryogenic variation
  • device modeling
  • low temperature
  • MOSFET modeling
  • statistical modeling

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