Stochastic coulomb interactions in ion projection lithography systems with aberration-broadened crossover

P Kruit, JE Barth, G Lammer, A Chalupka, H Vonach, H Löschner, G Stengl

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	2369-2372
Number of pages	4
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	15
Issue number	6
Publication status	Published - 1997

Cite this

@article{63167e200cd34806ac43cf4222a63990,

title = "Stochastic coulomb interactions in ion projection lithography systems with aberration-broadened crossover",

author = "P Kruit and JE Barth and G Lammer and A Chalupka and H Vonach and H L{\"o}schner and G Stengl",

year = "1997",

language = "Undefined/Unknown",

volume = "15",

pages = "2369--2372",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Stochastic coulomb interactions in ion projection lithography systems with aberration-broadened crossover

AU - Kruit, P

AU - Barth, JE

AU - Lammer, G

AU - Chalupka, A

AU - Vonach, H

AU - Löschner, H

AU - Stengl, G

PY - 1997

Y1 - 1997

M3 - Article

SN - 1071-1023

VL - 15

SP - 2369

EP - 2372

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -