Stochastic coulomb interactions in ion projection lithography systems with aberration-broadened crossover

P Kruit, JE Barth, G Lammer, A Chalupka, H Vonach, H Löschner, G Stengl

    Research output: Contribution to journalArticleScientificpeer-review

    2 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)2369-2372
    Number of pages4
    JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
    Issue number6
    Publication statusPublished - 1997

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