Structural models of a-Si:H with a low defect concentration: a first-principles molecular dynamics study

K Jarolimek, GA de Wijs, RA de Groot, M Zeman

Research output: Contribution to journalArticleScientificpeer-review

Abstract

We present a theoretical study of hydrogenated amorphous silicon (a-Si:H) with a device quality hydrogen concentration of 11 at%. We used a first principle, parameters-free method. The interaction between the atoms was treated quantum mechanically within the density functional theory approximation. Amorphous structures were prepared by cooling from the liquid phase. When using a cooling rate of 0.02¿K/fs defect-free structures were prepared. All silicon atoms were fourfold coordinated and there were no defect states in the band gap. The calculated short range order showed a good agreement with available neutron scattering measurements. We further calculated the formation energy of dangling bonds (DBs; threefold coordinated Si atom) in all three charge states (negative, neutral, and positive) as a function of the Fermi energy. Interestingly, the DB correlation energies can have both positive and negative values.
Original languageEnglish
Pages (from-to)605-608
Number of pages4
JournalPhysica Status Solidi. A: Applications and Materials Science (online)
Volume207
Issue number3
DOIs
Publication statusPublished - 2010

Keywords

  • academic journal papers
  • CWTS JFIS < 0.75

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