Sub-10-nm nanolithography with a scanning helium beam

VA Sidorkin, E van Veldhoven, EWJM van der Drift, PFA Alkemade, HWM Salemink, D Maas

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	L18-L20
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	B27
Issue number	4
Publication status	Published - 2009

Keywords

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title = "Sub-10-nm nanolithography with a scanning helium beam",

keywords = "academic journal papers, CWTS JFIS < 0.75",

author = "VA Sidorkin and Veldhoven, {E van} and {van der Drift}, EWJM and PFA Alkemade and HWM Salemink and D Maas",

year = "2009",

language = "Undefined/Unknown",

volume = "B27",

pages = "L18--L20",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "4",

}

TY - JOUR

T1 - Sub-10-nm nanolithography with a scanning helium beam

AU - Sidorkin, VA

AU - Veldhoven, E van

AU - van der Drift, EWJM

AU - Alkemade, PFA

AU - Salemink, HWM

AU - Maas, D

PY - 2009

Y1 - 2009

KW - academic journal papers

KW - CWTS JFIS < 0.75

M3 - Article

SN - 1071-1023

VL - B27

SP - L18-L20

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 4

ER -