Sub- 10-nm structures written in ultra-thin HSQ resist layers, using Electron Beam Lithography

AE Grigorescu, MC van der Krogt, CW Hagen

Research output: Contribution to journalConference articleScientificpeer-review

9 Citations (Scopus)
Original languageUndefined/Unknown
JournalProceedings of SPIE- International Society for Optical Engineering
Publication statusPublished - 2007


  • conference contrib. refereed
  • Peer-lijst tijdschrift

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