Subaperture phase reconstruction from a Hartmann wavefront sensor by phase retrieval method for application in EUV adaptive optics

A Polo; N van Marrewijk; SF Pereira; HP Urbach

Subaperture phase reconstruction from a Hartmann wavefront sensor by phase retrieval method for application in EUV adaptive optics

A Polo, N van Marrewijk, SF Pereira, HP Urbach

ImPhys/Optics

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Extreme Ultraviolet (EUV) Lithography III
Editors	PP Naulleau, Obert R. Wood II
Place of Publication	sn
Publisher	SPIE
Pages	1-9
Number of pages	9
Publication status	Published - 2012
Event	Extreme Ultraviolet (EUV) Lithography III Patrick P. Naulleau; Obert R. Wood II San Jose, California \| February 12, 2012 - sn Duration: 12 Feb 2012 → …

Publication series

Name
Publisher	SPIE

Name	Proceedings of SPIE- International Society for Optical Engineering
Volume	8322
ISSN (Print)	0277-786X

Conference

Conference	Extreme Ultraviolet (EUV) Lithography III Patrick P. Naulleau; Obert R. Wood II San Jose, California \| February 12, 2012
Period	12/02/12 → …

Cite this

Polo, A., van Marrewijk, N., Pereira, SF., & Urbach, HP. (2012). Subaperture phase reconstruction from a Hartmann wavefront sensor by phase retrieval method for application in EUV adaptive optics. In PP. Naulleau, & Obert R. Wood II (Eds.), Extreme Ultraviolet (EUV) Lithography III (pp. 1-9). (Proceedings of SPIE- International Society for Optical Engineering; Vol. 8322). SPIE.

@inproceedings{9c5bc0cc11094f97872bb20c63d1c5fd,

title = "Subaperture phase reconstruction from a Hartmann wavefront sensor by phase retrieval method for application in EUV adaptive optics",

author = "A Polo and {van Marrewijk}, N and SF Pereira and HP Urbach",

year = "2012",

language = "Undefined/Unknown",

publisher = "SPIE",

pages = "1--9",

editor = "PP Naulleau and {Obert R. Wood II}",

booktitle = "Extreme Ultraviolet (EUV) Lithography III",

address = "United States",

note = "Extreme Ultraviolet (EUV) Lithography III Patrick P. Naulleau; Obert R. Wood II San Jose, California | February 12, 2012 ; Conference date: 12-02-2012",

}

Polo, A, van Marrewijk, N, Pereira, SF & Urbach, HP 2012, Subaperture phase reconstruction from a Hartmann wavefront sensor by phase retrieval method for application in EUV adaptive optics. in PP Naulleau & Obert R. Wood II (eds), Extreme Ultraviolet (EUV) Lithography III. Proceedings of SPIE- International Society for Optical Engineering, vol. 8322, SPIE, sn, pp. 1-9, Extreme Ultraviolet (EUV) Lithography III Patrick P. Naulleau; Obert R. Wood II San Jose, California | February 12, 2012, 12/02/12.

Subaperture phase reconstruction from a Hartmann wavefront sensor by phase retrieval method for application in EUV adaptive optics. / Polo, A; van Marrewijk, N; Pereira, SF et al.
Extreme Ultraviolet (EUV) Lithography III. ed. / PP Naulleau; Obert R. Wood II. sn: SPIE, 2012. p. 1-9 (Proceedings of SPIE- International Society for Optical Engineering; Vol. 8322).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Subaperture phase reconstruction from a Hartmann wavefront sensor by phase retrieval method for application in EUV adaptive optics

AU - Polo, A

AU - van Marrewijk, N

AU - Pereira, SF

AU - Urbach, HP

PY - 2012

Y1 - 2012

M3 - Conference contribution

SP - 1

EP - 9

BT - Extreme Ultraviolet (EUV) Lithography III

A2 - Naulleau, PP

A2 - Obert R. Wood II, null

PB - SPIE

CY - sn

T2 - Extreme Ultraviolet (EUV) Lithography III Patrick P. Naulleau; Obert R. Wood II San Jose, California | February 12, 2012

Y2 - 12 February 2012

ER -