Surface roughness analysis of ETP-CVD a-Si:H thin films

MA Wank, RACMM van Swaaij, MCM van de Sanden

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	The annual workshop on semiconductor advances for future electronics and sensors
Editors	s.n.
Place of Publication	Veldhoven, the Nederlands
Pages	516-519
Number of pages	4
Publication status	Published - 2008
Event	SAFE 2008, Veldhoven, the Netherlands - Veldhoven, the Nederlands Duration: 27 Nov 2008 → 28 Nov 2008

Conference	SAFE 2008, Veldhoven, the Netherlands
Period	27/11/08 → 28/11/08

Keywords

@inproceedings{08578f77a1684c73ab31febd96a5436f,

title = "Surface roughness analysis of ETP-CVD a-Si:H thin films",

keywords = "conference contrib. refereed, Vakpubl., Overig wet. > 3 pag",

author = "MA Wank and {van Swaaij}, RACMM and {van de Sanden}, MCM",

year = "2008",

language = "Undefined/Unknown",

isbn = "978-90-73461-56-7",

pages = "516--519",

editor = "s.n.",

booktitle = "The annual workshop on semiconductor advances for future electronics and sensors",

note = "null ; Conference date: 27-11-2008 Through 28-11-2008",

}

The annual workshop on semiconductor advances for future electronics and sensors. ed. / s.n. Veldhoven, the Nederlands, 2008. p. 516-519.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Surface roughness analysis of ETP-CVD a-Si:H thin films

AU - Wank, MA

AU - van Swaaij, RACMM

AU - van de Sanden, MCM

PY - 2008

Y1 - 2008

KW - conference contrib. refereed

KW - Vakpubl., Overig wet. > 3 pag

M3 - Conference contribution

SN - 978-90-73461-56-7

SP - 516

EP - 519

BT - The annual workshop on semiconductor advances for future electronics and sensors

A2 - s.n., null

CY - Veldhoven, the Nederlands

Y2 - 27 November 2008 through 28 November 2008

ER -