System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

SWHK Steenbrink (Inventor), P Kruit (Inventor)

Research output: Patent

Original language	Undefined/Unknown
Patent number	US7710009 B2
IPC	Aanvrager: Mapper Lithography IP B.V.
Priority date	4/05/10
Publication status	Published - 2010

Aanvrager: Mapper Lithography IP B.V.

Keywords

@misc{021028fff72b443d99e5f457927f7431,

title = "System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission",

keywords = "Octrooi, Verleend",

author = "SWHK Steenbrink and P Kruit",

note = "Aanvrager: Mapper Lithography IP B.V.; US7710009 B2; Aanvrager: Mapper Lithography IP B.V.",

year = "2010",

language = "Undefined/Unknown",

type = "Patent",

}