System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

SWHK Steenbrink (Inventor), P Kruit (Inventor)

    Research output: Patent

    Original languageUndefined/Unknown
    Patent numberUS7710009 B2
    IPCAanvrager: Mapper Lithography IP B.V.
    Priority date4/05/10
    Publication statusPublished - 2010

    Keywords

    • Octrooi
    • Verleend

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