System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

S. Steenbrink (Inventor), P Kruit (Inventor)

    Research output: Patent

    Original languageEnglish
    Patent numberUS2010219357 A1
    IPCAanvrager: Mapper Lithography IP BV
    Priority date2/09/10
    Publication statusPublished - 2010

    Keywords

    • Octrooi
    • Geen VSNU-classificatie

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