System, Method and Apparatus for Multi-Beam Lithography including a Dispenser Cathode for homogeneous electron Emission

S.W.H.K. Steenbrink (Inventor), P Kruit (Inventor)

    Research output: Patent

    Original languageEnglish
    Patent numberUS7215070 B2
    IPCAanvrager: Mapper Lithography
    Priority date8/05/07
    Publication statusPublished - 2007

    Bibliographical note

    Aanvrager: Mapper Lithography

    Keywords

    • Octrooi
    • Verleend

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