System, Method and Apparatus for Multi-Beam Lithography including a Dispenser Cathode for homogeneous electron Emission

S.W.H.K. Steenbrink (Inventor), P Kruit (Inventor)

Research output: Patent

Original language	English
Patent number	US7215070 B2
IPC	Aanvrager: Mapper Lithography
Priority date	8/05/07
Publication status	Published - 2007

Aanvrager: Mapper Lithography

Keywords

@misc{a188a4a9416f49c19b714898127ef412,

title = "System, Method and Apparatus for Multi-Beam Lithography including a Dispenser Cathode for homogeneous electron Emission",

keywords = "Octrooi, Verleend",

author = "S.W.H.K. Steenbrink and P Kruit",

note = "Aanvrager: Mapper Lithography; US7215070 B2; Aanvrager: Mapper Lithography",

year = "2007",

language = "English",

type = "Patent",

}