Temperature dependency of the kinetics of PureB CVD deposition over patterned Si/SiO2 surfaces

V Mohammadi, N Golshani, C Mok Kai Rine, WB De Boer, J Derakhshandeh Kheljani, LK Nanver

Research output: Contribution to journal › Article › Scientific › peer-review

18 Citations (Scopus)

Original language	English
Pages (from-to)	45-50
Number of pages	6
Journal	Microelectronic Engineering
Volume	125
DOIs	https://doi.org/10.1016/j.mee.2014.03.015
Publication status	Published - 2014

Harvest
Online available April 3, 2014

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title = "Temperature dependency of the kinetics of PureB CVD deposition over patterned Si/SiO2 surfaces",

author = "V Mohammadi and N Golshani and {Mok Kai Rine}, C and {De Boer}, WB and {Derakhshandeh Kheljani}, J and LK Nanver",

note = "Harvest Online available April 3, 2014",

year = "2014",

doi = "10.1016/j.mee.2014.03.015",

language = "English",

volume = "125",

pages = "45--50",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Temperature dependency of the kinetics of PureB CVD deposition over patterned Si/SiO2 surfaces

AU - Mohammadi, V

AU - Golshani, N

AU - Mok Kai Rine, C

AU - De Boer, WB

AU - Derakhshandeh Kheljani, J

AU - Nanver, LK

N1 - Harvest Online available April 3, 2014

PY - 2014

Y1 - 2014

U2 - 10.1016/j.mee.2014.03.015

DO - 10.1016/j.mee.2014.03.015

M3 - Article

SN - 0167-9317

VL - 125

SP - 45

EP - 50

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -