Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

G Craciun, MA Blauw, EWJM van der Drift, PM Sarro, PJ French

Research output: Contribution to journalArticleScientificpeer-review

41 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)390-394
Number of pages5
JournalJournal of Micromechanics and Microengineering
Volume12
Publication statusPublished - 2002

Keywords

  • ZX CWTS 1.00 <= JFIS < 3.00

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