Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	390-394
Number of pages	5
Journal	Journal of Micromechanics and Microengineering
Volume	12
Publication status	Published - 2002

Keywords

@article{7da9a81cbd5847fb98eea8102385ca7d,

title = "Temperature influence on etching deep holes with SF6/O2 cryogenic plasma",

keywords = "ZX CWTS 1.00 <= JFIS < 3.00",

author = "G Craciun and MA Blauw and \{van der Drift\}, EWJM and PM Sarro and PJ French",

year = "2002",

language = "Undefined/Unknown",

volume = "12",

pages = "390--394",

journal = "Journal of Micromechanics and Microengineering",

issn = "0960-1317",

publisher = "IOP Publishing Ltd.",

}

TY - JOUR

T1 - Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

AU - Craciun, G

AU - Blauw, MA

AU - van der Drift, EWJM

AU - Sarro, PM

AU - French, PJ

PY - 2002

Y1 - 2002

KW - ZX CWTS 1.00 <= JFIS < 3.00

M3 - Article

SN - 0960-1317

VL - 12

SP - 390

EP - 394

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

ER -