The atomic layer deposition array defined by etch-back technique: a new method to fabricate TiO2 nanopillars, nanotubes and nanochannel arrays

Y Huang; G Pandraud; PM Sarro

doi:10.1088/0957-4484/23/48/485306

The atomic layer deposition array defined by etch-back technique: a new method to fabricate TiO2 nanopillars, nanotubes and nanochannel arrays

Y Huang, G Pandraud, PM Sarro

Electronic Components, Technology and Materials

Research output: Contribution to journal › Article › Scientific › peer-review

19 Citations (SciVal)

Original language	English
Pages (from-to)	1-8
Number of pages	8
Journal	Nanotechnology
Volume	23
DOIs	https://doi.org/10.1088/0957-4484/23/48/485306
Publication status	Published - 2012

Keywords

academic journal papers
CWTS 0.75 <= JFIS < 2.00

Access to Document

10.1088/0957-4484/23/48/485306

Cite this

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title = "The atomic layer deposition array defined by etch-back technique: a new method to fabricate TiO2 nanopillars, nanotubes and nanochannel arrays",

keywords = "academic journal papers, CWTS 0.75 <= JFIS < 2.00",

author = "Y Huang and G Pandraud and PM Sarro",

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language = "English",

volume = "23",

pages = "1--8",

journal = "Nanotechnology",

issn = "0957-4484",

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AU - Huang, Y

AU - Pandraud, G

AU - Sarro, PM

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Y1 - 2012

KW - academic journal papers

KW - CWTS 0.75 <= JFIS < 2.00

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DO - 10.1088/0957-4484/23/48/485306

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JO - Nanotechnology

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