The effect of sidewall roughness on line edge roughness in top-down scanning electron microscopy images

T Verduin, SR Lokhorst, P Kruit, CW Hagen

    Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

    7 Citations (Scopus)
    Original languageEnglish
    Title of host publicationMetrology, Inspection, and Process Control for Microlithography XXIX
    EditorsJP Cain, MI Sanchez
    Place of PublicationBellingham, WA, USA
    PublisherSPIE
    Pages1-18
    Number of pages18
    ISBN (Print)9781628415261
    DOIs
    Publication statusPublished - 2015
    EventMetrology, Inspection, and Process Control for Microlithography XXIX - San Jose, CA, United States
    Duration: 23 Feb 201526 Feb 2015

    Publication series

    Name
    PublisherSPIE
    NameProceedings of SPIE- International Society for Optical Engineering
    Volume9424
    ISSN (Print)0277-786X

    Conference

    ConferenceMetrology, Inspection, and Process Control for Microlithography XXIX
    Country/TerritoryUnited States
    CitySan Jose, CA
    Period23/02/1526/02/15

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