The effect of the silicon top layer of Silicon-Implanted-with-Oxygen on the uptake and release of deuterium by the buried oxide

L Zimmermann, JMM de Nijs, PFA Alkemade, K Westerduin, AM van Veen

    Research output: Contribution to journalArticleScientificpeer-review

    1 Citation (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)774-777
    Number of pages4
    JournalApplied Physics Letters
    Issue number6
    Publication statusPublished - 1998

    Bibliographical note

    ISSN: 00036951

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