The influence of ion beam parameters on pattern resolution

PWH Jager, CW Hagen, P Kruit

    Research output: Contribution to journalArticleScientificpeer-review

    12 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)353-356
    Number of pages4
    JournalMicroelectronic Engineering
    Volume30
    Publication statusPublished - 1996

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