The K2S208-KOH photoetching system for GaN

JL Weyher, FD Tichelaar, DH van Dorp, JJ Kelly, A Khachapuridze

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    A recently developed photoetching system for n-type GaN, a KOH solution containing the strong oxidizing agent potassium peroxydisulphate (K2S2O8), was studied in detail. By careful selection of the etching parameters, such as the ratio of components and the hydrodynamics, two distinct modes were defined: defect-selective etching (denoted by KSO-D) and polishing (KSO-P). Both photoetching methods can be used under open-circuit (electroless) conditions. Well-defined dislocation-related etch whiskers are formed during KSO-D etching. All types of dislocations are revealed, and this was confirmed by cross-sectional TEM examination of the etched samples. Extended electrically active defects are also clearly revealed. The known relationship between etch rate and carrier concentration for photoetching of GaN in KOH solutions was confirmed for KSO-D etch using Raman measurements. It is shown that during KSO-P etching diffusion is the rate-limiting step, i.e. this etch is suitable for polishing of GaN. Some constraints of the KSO etching system for GaN are discussed and peculiar etch features, so far not understood, are described.
    Original languageEnglish
    Pages (from-to)2607-2610
    Number of pages4
    JournalJournal of Crystal Growth
    Issue number18
    Publication statusPublished - 2010


    • academic journal papers
    • CWTS 0.75 <= JFIS < 2.00


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