The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering

TGM Oosterlaken; GJ Leusink; GCAM Janssen; S Radelaar

The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering

TGM Oosterlaken, GJ Leusink, GCAM Janssen, S Radelaar

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition
Editors	MD Allendorf, TM Besman, McD Robinson, RK Ulrich
Publisher	Electrochemical Society
Pages	808-813
Number of pages	6
Volume	96
Edition	5
ISBN (Print)	9781566771559
Publication status	Published - 1996
Event	CVD XIII - 13th International Conference on Chemical Vapour Deposition - Los Angeles, CA, United States Duration: 5 May 1996 → 10 May 1996

Publication series

Name

Name	Electrochemical Society Proceedings
Publisher	Electrochemical Society

Conference

Conference	CVD XIII - 13th International Conference on Chemical Vapour Deposition
Country/Territory	United States
City	Los Angeles, CA
Period	5/05/96 → 10/05/96

Access to Document

https://books.google.nl/books?id=Mz6t3JLWotgC&pg=PA808&lpg=PA808&dq=The+kinetics+of+tungsten+deposition+from+a+H2/WF6+mixture+studied+by+in+situ+laser+Raman+scattering&source=bl&ots=sUOMBs16Tm&sig=jvK0p1wGq4L0q-2oZcsqt5MuxP8&hl=nl&sa=X&ved=0ahUKEwjX5-LrzPfMAhWhBsAKHR5aBIwQ6AEILDAA#v=onepage&q=The%20kinetics%20of%20tungsten%20deposition%20from%20a%20H2%2FWF6%20mixture%20studied%20by%20in%20situ%20laser%20Raman%20scattering&f=false

Cite this

Oosterlaken, TGM., Leusink, GJ., Janssen, GCAM., & Radelaar, S. (1996). The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering. In MD. Allendorf, TM. Besman, M. Robinson, & RK. Ulrich (Eds.), Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition (5 ed., Vol. 96, pp. 808-813). (Electrochemical Society Proceedings). Electrochemical Society. https://books.google.nl/books?id=Mz6t3JLWotgC&pg=PA808&lpg=PA808&dq=The+kinetics+of+tungsten+deposition+from+a+H2/WF6+mixture+studied+by+in+situ+laser+Raman+scattering&source=bl&ots=sUOMBs16Tm&sig=jvK0p1wGq4L0q-2oZcsqt5MuxP8&hl=nl&sa=X&ved=0ahUKEwjX5-LrzPfMAhWhBsAKHR5aBIwQ6AEILDAA#v=onepage&q=The%20kinetics%20of%20tungsten%20deposition%20from%20a%20H2%2FWF6%20mixture%20studied%20by%20in%20situ%20laser%20Raman%20scattering&f=false

Oosterlaken, TGM ; Leusink, GJ ; Janssen, GCAM et al. / The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering. Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition. editor / MD Allendorf ; TM Besman ; McD Robinson ; RK Ulrich. Vol. 96 5. ed. Electrochemical Society, 1996. pp. 808-813 (Electrochemical Society Proceedings).

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title = "The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering",

author = "TGM Oosterlaken and GJ Leusink and GCAM Janssen and S Radelaar",

year = "1996",

language = "English",

isbn = "9781566771559",

volume = "96",

publisher = "Electrochemical Society",

pages = "808--813",

editor = "MD Allendorf and TM Besman and McD Robinson and RK Ulrich",

booktitle = "Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition",

edition = "5",

note = "CVD XIII - 13th International Conference on Chemical Vapour Deposition ; Conference date: 05-05-1996 Through 10-05-1996",

}

Oosterlaken, TGM, Leusink, GJ, Janssen, GCAM & Radelaar, S 1996, The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering. in MD Allendorf, TM Besman, M Robinson & RK Ulrich (eds), Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition. 5 edn, vol. 96, Electrochemical Society Proceedings, Electrochemical Society, pp. 808-813, CVD XIII - 13th International Conference on Chemical Vapour Deposition, Los Angeles, CA, United States, 5/05/96. <https://books.google.nl/books?id=Mz6t3JLWotgC&pg=PA808&lpg=PA808&dq=The+kinetics+of+tungsten+deposition+from+a+H2/WF6+mixture+studied+by+in+situ+laser+Raman+scattering&source=bl&ots=sUOMBs16Tm&sig=jvK0p1wGq4L0q-2oZcsqt5MuxP8&hl=nl&sa=X&ved=0ahUKEwjX5-LrzPfMAhWhBsAKHR5aBIwQ6AEILDAA#v=onepage&q=The%20kinetics%20of%20tungsten%20deposition%20from%20a%20H2%2FWF6%20mixture%20studied%20by%20in%20situ%20laser%20Raman%20scattering&f=false>

The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering. / Oosterlaken, TGM; Leusink, GJ; Janssen, GCAM et al.
Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition. ed. / MD Allendorf; TM Besman; McD Robinson; RK Ulrich. Vol. 96 5. ed. Electrochemical Society, 1996. p. 808-813 (Electrochemical Society Proceedings).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering

AU - Oosterlaken, TGM

AU - Leusink, GJ

AU - Janssen, GCAM

AU - Radelaar, S

PY - 1996

Y1 - 1996

M3 - Conference contribution

SN - 9781566771559

VL - 96

SP - 808

EP - 813

BT - Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition

A2 - Allendorf, MD

A2 - Besman, TM

A2 - Robinson, McD

A2 - Ulrich, RK

PB - Electrochemical Society

T2 - CVD XIII - 13th International Conference on Chemical Vapour Deposition

Y2 - 5 May 1996 through 10 May 1996

ER -

Oosterlaken TGM, Leusink GJ, Janssen GCAM, Radelaar S. The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering. In Allendorf MD, Besman TM, Robinson M, Ulrich RK, editors, Proceedings of the Thirteenth International Conference on Chemical Vapour Deposition. 5 ed. Vol. 96. Electrochemical Society. 1996. p. 808-813. (Electrochemical Society Proceedings).