The Near Field Characteristics of teh Focused Field Embedded in the Super-RENS Layer Applied to Lithography

AC Assafrao, SF Pereira, HP Urbach

Research output: Contribution to journalConference articleScientificpeer-review

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)1-7
Number of pages7
JournalProceedings of SPIE- International Society for Optical Engineering
Volume8326
DOIs
Publication statusPublished - 2012

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