The need for multi-scale approaches in Cu/low-k reliability issues

CA Yuan, O van der Sluis, WD van Driel, GQ Zhang

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	833-842
Number of pages	10
Journal	Microelectronics Reliability
Volume	48
DOIs	https://doi.org/doi:10.1016/j.microrel.2008.03.024
Publication status	Published - 2008

Keywords

@article{83b355bb732c4d90afc4864384e0c37b,

title = "The need for multi-scale approaches in Cu/low-k reliability issues",

keywords = "CWTS JFIS < 0.75",

author = "CA Yuan and {van der Sluis}, O and {van Driel}, WD and GQ Zhang",

year = "2008",

doi = "doi:10.1016/j.microrel.2008.03.024",

language = "Undefined/Unknown",

volume = "48",

pages = "833--842",

journal = "Microelectronics Reliability",

issn = "0026-2714",

publisher = "Elsevier",

}

TY - JOUR

T1 - The need for multi-scale approaches in Cu/low-k reliability issues

AU - Yuan, CA

AU - van der Sluis, O

AU - van Driel, WD

AU - Zhang, GQ

PY - 2008

Y1 - 2008

KW - CWTS JFIS < 0.75

U2 - doi:10.1016/j.microrel.2008.03.024

DO - doi:10.1016/j.microrel.2008.03.024

M3 - Article

SN - 0026-2714

VL - 48

SP - 833

EP - 842

JO - Microelectronics Reliability

JF - Microelectronics Reliability

ER -