The Role of Anodising Parameters in the Performance of Bare and Coated Aerospace Anodic Oxide Films

Mariana Paz Martinez-Viademonte*, Shoshan T. Abrahami, Meisam D. Havigh, Kristof Marcoen, Theodor Hack, Malte Burchardt, Herman Terryn

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)
59 Downloads (Pure)


The anodising process parameters (voltage, temperature, and electrolyte) control the morphology and the chemical composition of the resulting anodic oxide film by altering the balance between oxide growth and oxide dissolution reactions. The porosity of the oxide film is reduced by the addition of tartaric acid to a sulfuric acid electrolyte, while anodising at elevated temperatures enhances oxide dissolution, leading to wider pores and rougher surfaces. No significant changes in the oxide chemical composition as a function of anodising parameters was found; in particular, no tartrate incorporation took place. The resistance of uncoated anodic oxide films against aggressive media and galvanic stress as a function of anodising parameters has been studied by electrochemical methods. Anodising in a mixed tartaric and sulfuric acid electrolyte improves the resistance of the anodic oxide against galvanic stress and aggressive media in comparison to sulfuric acid ano-dising processes. However, the corrosion protection performance of the anodic oxide films in com-bination with a corrosion-inhibitor loaded organic coating is not governed by the blank oxide properties but by the adhesion-enhancing morphological features formed during anodising at elevated temperatures at the oxide/coating interface.

Original languageEnglish
Article number908
Number of pages23
Issue number7
Publication statusPublished - 2022


  • AA2024
  • anodising
  • pitting corrosion
  • tartaric-sulphuric acid


Dive into the research topics of 'The Role of Anodising Parameters in the Performance of Bare and Coated Aerospace Anodic Oxide Films'. Together they form a unique fingerprint.

Cite this