The role of the silyl radical in plasma deposition of microcrystalline silicon

C Smit, RACMM van Swaaij, EAG Hamers, MCM van de Sanden

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)4076-4083
Number of pages8
JournalJournal of Applied Physics
Volume96
Issue number8
Publication statusPublished - 2004

Bibliographical note

ed.is niet bekend

Keywords

  • ZX CWTS 1.00 <= JFIS < 3.00

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