INIS
annealing
100%
films
100%
optical filters
100%
chemical vapor deposition
100%
silicon oxides
100%
residual stresses
42%
layers
42%
membranes
28%
thickness
28%
optical properties
28%
control
14%
budgets
14%
applications
14%
scattering
14%
variations
14%
thermal expansion
14%
comparative evaluations
14%
temperature dependence
14%
tools
14%
mechanical properties
14%
deposition
14%
Material Science
Silicon
100%
Oxide Film
100%
Annealing
100%
Residual Stress
75%
Oxide Compound
50%
Optical Property
50%
Membrane
50%
Film
25%
Temperature
25%
Mechanical Property
25%
Ultimate Tensile Strength
25%
Thermal Expansion
25%
Engineering
Annealing
100%
Silicon Oxide
100%
Oxide Layer
50%
Low Stress
25%
Tensile Stress σ
25%
Compressive Stress
25%
Micron
25%
Characteristics
25%
Process Step
25%
Tensiles
25%
Coefficient of Thermal Expansion
25%
Deposited Film
25%
Deposition Parameter
25%