Time-resolved in-situ x-ray diffraction study of the formation of 3D-hexagonal mesoporous silica films

D. Grosso, P.A. Albouy, H. Amenitsch, A. R. Balkenende, F. Babonneau

Research output: Contribution to journalConference articleScientificpeer-review

8 Citations (Scopus)

Abstract

Highly oriented 3D-hexagonal silica thin films have been produced on silicon substrates by dip-coating technique, using cetyltrimethylammonium (CTAB) bromide as structuring agent. For the first time, time-resolved in situ X-ray diffraction experiments have been used to investigate the formation of such mesostructured films. Interestingly, the data shows that an intermediate mesophase appears just after film deposition (t<500 ms), characterized by one diffraction peak centered at a d spacing of 65 Å. Then after 20 s, another mesophase appears with a shorter d spacing (44 Å), which corresponds to the 3D-hexagonal structure found for the final dried film.

Original languageEnglish
Pages (from-to)CC6.17.1-CC6.17.6
JournalMRS Online Proceedings Library
Volume628
DOIs
Publication statusPublished - 2000
Externally publishedYes
EventOrganic/Inorganic Hybrid Materials-2000 - San Francisco, CA, United States
Duration: 24 Apr 200028 Apr 2000

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