Towards 2-10 nm electron-beam lithography: a quantitative approach

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)805-809
Number of pages5
JournalMicroelectronic Engineering
Volume85
Publication statusPublished - 2008

Keywords

  • CWTS JFIS < 0.75

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