Towards Commercially Available Quartz Calibration Substrates

Luca Galatro; Carmine De Martino; Jos van 't Hof; Mohammed Alomari; Holger Sailer; Joachim Burghartz; Marco Spirito

doi:10.1109/ARFTG47271.2020.9241374

Towards Commercially Available Quartz Calibration Substrates

Luca Galatro, Carmine De Martino, Jos van 't Hof, Mohammed Alomari, Holger Sailer, Joachim Burghartz, Marco Spirito

Electronics

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

2 Citations (Scopus)

Abstract

In this contribution we present the developments and current performance of calibration substrates manufactured on 150 mm Quartz wafers (675 μm thick) based on a CMOS process technology. The passive structures required to realize on-wafer vector network analyzer calibration standards are benchmarked against commercially available (i.e., Alumina) substrates. First, an analysis of the process stability is presented for both reflective and resistive impedances across the entire wafer (i.e., 24 dies). Full-wave EM simulations are employed to realize accurate calibration artefact models aiming to achieve state-of-the-art calibration accuracy. The calibration quality in finally benchmarked on an independent line realized in the back-end-of-line of a Silicon based technology up to 67.5 GHz.

Original language	English
Title of host publication	2020 95th ARFTG Microwave Measurement Conference (ARFTG)
Subtitle of host publication	Proceedings
Publisher	IEEE
Pages	1-5
Number of pages	5
ISBN (Electronic)	978-1-7281-0951-0
ISBN (Print)	978-1-7281-0952-7
DOIs	https://doi.org/10.1109/ARFTG47271.2020.9241374
Publication status	Published - 2020
Event	ARFTG 2020: The 95th ARFTG Microwave Measurement Conference (ARFTG) - Los Angeles, United States Duration: 4 Aug 2020 → 6 Aug 2020 Conference number: 95

Conference

Conference	ARFTG 2020
Country/Territory	United States
City	Los Angeles
Period	4/08/20 → 6/08/20

Keywords

RSOL
VNA
calibration
fused silica
on-wafer
probe-level

Access to Document

10.1109/ARFTG47271.2020.9241374

Cite this

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title = "Towards Commercially Available Quartz Calibration Substrates",

abstract = "In this contribution we present the developments and current performance of calibration substrates manufactured on 150 mm Quartz wafers (675 μm thick) based on a CMOS process technology. The passive structures required to realize on-wafer vector network analyzer calibration standards are benchmarked against commercially available (i.e., Alumina) substrates. First, an analysis of the process stability is presented for both reflective and resistive impedances across the entire wafer (i.e., 24 dies). Full-wave EM simulations are employed to realize accurate calibration artefact models aiming to achieve state-of-the-art calibration accuracy. The calibration quality in finally benchmarked on an independent line realized in the back-end-of-line of a Silicon based technology up to 67.5 GHz.",

keywords = "RSOL, VNA, calibration, fused silica, on-wafer, probe-level",

author = "Luca Galatro and {De Martino}, Carmine and {van 't Hof}, Jos and Mohammed Alomari and Holger Sailer and Joachim Burghartz and Marco Spirito",

year = "2020",

doi = "10.1109/ARFTG47271.2020.9241374",

language = "English",

isbn = "978-1-7281-0952-7",

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booktitle = "2020 95th ARFTG Microwave Measurement Conference (ARFTG)",

publisher = "IEEE",

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note = "ARFTG 2020 : The 95th ARFTG Microwave Measurement Conference (ARFTG) ; Conference date: 04-08-2020 Through 06-08-2020",

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T1 - Towards Commercially Available Quartz Calibration Substrates

AU - Galatro, Luca

AU - De Martino, Carmine

AU - van 't Hof, Jos

AU - Alomari, Mohammed

AU - Sailer, Holger

AU - Burghartz, Joachim

AU - Spirito, Marco

N1 - Conference code: 95

PY - 2020

Y1 - 2020

N2 - In this contribution we present the developments and current performance of calibration substrates manufactured on 150 mm Quartz wafers (675 μm thick) based on a CMOS process technology. The passive structures required to realize on-wafer vector network analyzer calibration standards are benchmarked against commercially available (i.e., Alumina) substrates. First, an analysis of the process stability is presented for both reflective and resistive impedances across the entire wafer (i.e., 24 dies). Full-wave EM simulations are employed to realize accurate calibration artefact models aiming to achieve state-of-the-art calibration accuracy. The calibration quality in finally benchmarked on an independent line realized in the back-end-of-line of a Silicon based technology up to 67.5 GHz.

AB - In this contribution we present the developments and current performance of calibration substrates manufactured on 150 mm Quartz wafers (675 μm thick) based on a CMOS process technology. The passive structures required to realize on-wafer vector network analyzer calibration standards are benchmarked against commercially available (i.e., Alumina) substrates. First, an analysis of the process stability is presented for both reflective and resistive impedances across the entire wafer (i.e., 24 dies). Full-wave EM simulations are employed to realize accurate calibration artefact models aiming to achieve state-of-the-art calibration accuracy. The calibration quality in finally benchmarked on an independent line realized in the back-end-of-line of a Silicon based technology up to 67.5 GHz.

KW - RSOL

KW - VNA

KW - calibration

KW - fused silica

KW - on-wafer

KW - probe-level

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U2 - 10.1109/ARFTG47271.2020.9241374

DO - 10.1109/ARFTG47271.2020.9241374

M3 - Conference contribution

SN - 978-1-7281-0952-7

SP - 1

EP - 5

BT - 2020 95th ARFTG Microwave Measurement Conference (ARFTG)

PB - IEEE

T2 - ARFTG 2020

Y2 - 4 August 2020 through 6 August 2020

ER -

Towards Commercially Available Quartz Calibration Substrates

Abstract

Conference

Keywords

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