Transient ALD simulations for a multi-wafer reactor with trenched wafers

AM Lankhorst, BD Paarhuis, H.J.M.C. Terhorst, PJPM Simons, CR Kleijn

    Research output: Contribution to journalArticleScientificpeer-review

    47 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)8842-8848
    Number of pages7
    JournalSurface and Coatings Technology
    Volume201
    Issue number22-23 spec.iss
    Publication statusPublished - 2007

    Keywords

    • CWTS 0.75 <= JFIS < 2.00

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