Transient ALD simulations for a multi-wafer reactor with trenched wafers

AM Lankhorst, BD Paarhuis, H.J.M.C. Terhorst, PJPM Simons, CR Kleijn

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	8842-8848
Number of pages	7
Journal	Surface and Coatings Technology
Volume	201
Issue number	22-23 spec.iss
Publication status	Published - 2007

Keywords

@article{45e9aa5f9f914afbbb5c010c90d8c14f,

title = "Transient ALD simulations for a multi-wafer reactor with trenched wafers",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "AM Lankhorst and BD Paarhuis and H.J.M.C. Terhorst and PJPM Simons and CR Kleijn",

year = "2007",

language = "Undefined/Unknown",

volume = "201",

pages = "8842--8848",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier",

number = "22-23 spec.iss",

}

TY - JOUR

T1 - Transient ALD simulations for a multi-wafer reactor with trenched wafers

AU - Lankhorst, AM

AU - Paarhuis, BD

AU - Terhorst, H.J.M.C.

AU - Simons, PJPM

AU - Kleijn, CR

PY - 2007

Y1 - 2007

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 0257-8972

VL - 201

SP - 8842

EP - 8848

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 22-23 spec.iss

ER -