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Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry
RH Munnig Schmidt
Mechatronic Systems Design
Research output
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Contribution to journal
›
Article
›
Scientific
›
peer-review
100
Citations (Scopus)
Overview
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Dive into the research topics of 'Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry'. Together they form a unique fingerprint.
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INIS
control
100%
equipment
100%
precision
100%
semiconductor materials
100%
integrated circuits
100%
industry
100%
engineering
100%
positioning
66%
motion
66%
design
33%
production
33%
levels
33%
reduction
33%
meters
33%
metrology
33%
feedback
33%
range
33%
comminution
33%
density
33%
accuracy
33%
velocity
33%
randomness
33%
errors
33%
reviews
33%
stability
33%
tools
33%
Keyphrases
Exposure Tool
100%
Ultra-precision
100%
Moore's Law
66%
Lithographic Tools
33%
Model-based Feedforward Control
33%
Metrology
33%
Use of Feedback
33%
Nanometre
33%
Precision Model
33%
Motion Velocity
33%
Future Success
33%
Precision Positioning
33%
Technological Breakthrough
33%
Engineering
Size Reduction
33%