Ultrahigh resolution focused electron beam induces processing: the effect of substrate thickness

WF van Dorp, I Lazic, A Beyer, A Golzhauser, JB Wagner, TW Hansen, CW Hagen

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{c4587f54e51849a5bbcd23534ef401d4,

title = "Ultrahigh resolution focused electron beam induces processing: the effect of substrate thickness",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "{van Dorp}, WF and I Lazic and A Beyer and A Golzhauser and JB Wagner and TW Hansen and CW Hagen",

year = "2011",

language = "Undefined/Unknown",

volume = "22",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing",

number = "115303",

}