Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution

I Dogan; NJ Kramer; RHJ Westermann; K Dohnalova; AHM Smets; MA Verheijen; T Gregorkiewicz; MCM van de Sanden

doi:10.1063/1.4799402

Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution

I Dogan, NJ Kramer, RHJ Westermann, K Dohnalova, AHM Smets, MA Verheijen, T Gregorkiewicz, MCM van de Sanden

Photovoltaic Materials and Devices

Research output: Contribution to journal › Article › Scientific › peer-review

36 Citations (Scopus)

Original language	English
Pages (from-to)	1-10
Number of pages	10
Journal	Journal of Applied Physics
Volume	113
Issue number	13
DOIs	https://doi.org/10.1063/1.4799402
Publication status	Published - 2013

Bibliographical note

Harvest
Online 3-4-2013

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1063/1.4799402

Cite this

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title = "Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution",

author = "I Dogan and NJ Kramer and RHJ Westermann and K Dohnalova and AHM Smets and MA Verheijen and T Gregorkiewicz and {van de Sanden}, MCM",

note = "Harvest Online 3-4-2013",

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language = "English",

volume = "113",

pages = "1--10",

journal = "Journal of Applied Physics",

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AU - Dogan, I

AU - Kramer, NJ

AU - Westermann, RHJ

AU - Dohnalova, K

AU - Smets, AHM

AU - Verheijen, MA

AU - Gregorkiewicz, T

AU - van de Sanden, MCM

N1 - Harvest Online 3-4-2013

PY - 2013

Y1 - 2013

UR - http://resolver.tudelft.nl/uuid:c07d8cb6-62e9-4657-bc6e-eafb966a7733

U2 - 10.1063/1.4799402

DO - 10.1063/1.4799402

M3 - Article

SN - 0021-8979

VL - 113

SP - 1

EP - 10

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 13

ER -

Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution

Bibliographical note

UN SDGs

Access to Document

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Cite this