Ultrashallow doping by excimer laser drive-in of RPCVD surface deposited arsenic monolayers

M Popadic, LK Nanver, C Biasotto, V Gonda, J van der Cingel

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

1 Citation (Scopus)
Original languageUndefined/Unknown
Title of host publication16th IEEE international conference on advanced thermal processing of semiconductors
EditorsB Lojek
Place of Publications.l.
PublisherIEEE Society
Pages141-146
Number of pages6
ISBN (Print)978-1-4244-1950-0
Publication statusPublished - 2008
EventRTP 2008, Las Vegas, Nevada, USA - s.l.
Duration: 30 Sep 20083 Oct 2008

Publication series

Name
PublisherIEEE

Conference

ConferenceRTP 2008, Las Vegas, Nevada, USA
Period30/09/083/10/08

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

Cite this

Popadic, M., Nanver, LK., Biasotto, C., Gonda, V., & van der Cingel, J. (2008). Ultrashallow doping by excimer laser drive-in of RPCVD surface deposited arsenic monolayers. In B. Lojek (Ed.), 16th IEEE international conference on advanced thermal processing of semiconductors (pp. 141-146). IEEE Society.