Ultrashallow doping by excimer laser drive-in of RPCVD surface deposited arsenic monolayers

M Popadic; LK Nanver; C Biasotto; V Gonda; J van der Cingel

Ultrashallow doping by excimer laser drive-in of RPCVD surface deposited arsenic monolayers

M Popadic, LK Nanver, C Biasotto, V Gonda, J van der Cingel

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

2 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	16th IEEE international conference on advanced thermal processing of semiconductors
Editors	B Lojek
Place of Publication	s.l.
Publisher	IEEE Society
Pages	141-146
Number of pages	6
ISBN (Print)	978-1-4244-1950-0
Publication status	Published - 2008
Event	RTP 2008, Las Vegas, Nevada, USA - s.l. Duration: 30 Sept 2008 → 3 Oct 2008

Publication series

Name
Publisher	IEEE

Conference

Conference	RTP 2008, Las Vegas, Nevada, USA
Period	30/09/08 → 3/10/08

Keywords

conference contrib. refereed
Conf.proc. > 3 pag

Cite this

@inproceedings{61149edabe9a469ab47fa688977d112f,

title = "Ultrashallow doping by excimer laser drive-in of RPCVD surface deposited arsenic monolayers",

keywords = "conference contrib. refereed, Conf.proc. > 3 pag",

author = "M Popadic and LK Nanver and C Biasotto and V Gonda and {van der Cingel}, J",

year = "2008",

language = "Undefined/Unknown",

isbn = "978-1-4244-1950-0",

publisher = "IEEE Society",

pages = "141--146",

editor = "B Lojek",

booktitle = "16th IEEE international conference on advanced thermal processing of semiconductors",

note = "RTP 2008, Las Vegas, Nevada, USA ; Conference date: 30-09-2008 Through 03-10-2008",

}

Ultrashallow doping by excimer laser drive-in of RPCVD surface deposited arsenic monolayers. / Popadic, M; Nanver, LK; Biasotto, C et al.
16th IEEE international conference on advanced thermal processing of semiconductors. ed. / B Lojek. s.l.: IEEE Society, 2008. p. 141-146.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Ultrashallow doping by excimer laser drive-in of RPCVD surface deposited arsenic monolayers

AU - Popadic, M

AU - Nanver, LK

AU - Biasotto, C

AU - Gonda, V

AU - van der Cingel, J

PY - 2008

Y1 - 2008

KW - conference contrib. refereed

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 978-1-4244-1950-0

SP - 141

EP - 146

BT - 16th IEEE international conference on advanced thermal processing of semiconductors

A2 - Lojek, B

PB - IEEE Society

CY - s.l.

T2 - RTP 2008, Las Vegas, Nevada, USA

Y2 - 30 September 2008 through 3 October 2008

ER -