TY - JOUR
T1 - Understanding and Controlling the Aggregative Growth of Platinum Nanoparticles in Atomic Layer Deposition
T2 - an Avenue to Size Selection
AU - Grillo, Fabio
AU - Bui, Hao
AU - Moulijn, Jacob
AU - Kreutzer, Michiel
AU - van Ommen, Ruud
PY - 2017
Y1 - 2017
N2 - We present an atomistic understanding of the evolution of the size distribution with temperature and number of cycles in atomic layer deposition (ALD) of Pt nanoparticles (NPs). Atomistic modeling of our experiments teaches us that the NPs grow mostly via NP diffusion and coalescence rather than through single-atom processes such as precursor chemisorption, atom attachment, and Ostwald ripening. In particular, our analysis shows that the NP aggregation takes place during the oxygen half-reaction and that the NP mobility exhibits a size- and temperature-dependent scaling. Finally, we show that contrary to what has been widely reported, in general, one cannot simply control the NP size by the number of cycles alone. Instead, while the amount of Pt deposited can be precisely controlled over a wide range of temperatures, ALD-like precision over the NP size requires low deposition temperatures (e.g., T < 100 °C) when growth is dominated by atom attachment.
AB - We present an atomistic understanding of the evolution of the size distribution with temperature and number of cycles in atomic layer deposition (ALD) of Pt nanoparticles (NPs). Atomistic modeling of our experiments teaches us that the NPs grow mostly via NP diffusion and coalescence rather than through single-atom processes such as precursor chemisorption, atom attachment, and Ostwald ripening. In particular, our analysis shows that the NP aggregation takes place during the oxygen half-reaction and that the NP mobility exhibits a size- and temperature-dependent scaling. Finally, we show that contrary to what has been widely reported, in general, one cannot simply control the NP size by the number of cycles alone. Instead, while the amount of Pt deposited can be precisely controlled over a wide range of temperatures, ALD-like precision over the NP size requires low deposition temperatures (e.g., T < 100 °C) when growth is dominated by atom attachment.
UR - http://resolver.tudelft.nl/uuid:096fe588-11f9-45dc-86fa-dd6f09be2b7c
U2 - 10.1021/acs.jpclett.6b02978
DO - 10.1021/acs.jpclett.6b02978
M3 - Article
SN - 1948-7185
VL - 8
SP - 975
EP - 983
JO - The Journal of Physical Chemistry Letters
JF - The Journal of Physical Chemistry Letters
IS - 5
ER -