@inproceedings{f69b04833ba64104943b4b33422d99f7,
title = "Uniform photoresist coating of anisotropically etched cavities in silicon",
keywords = "ZX Int.klas.verslagjaar < 2002",
author = "VG Kiutchoukov and JR Mollinger and A Bossche",
year = "1999",
language = "Undefined/Unknown",
isbn = "90-73461-18-9",
publisher = "STW Technology Foundation",
pages = "697--700",
booktitle = "SAFE99: proceedings. ProRISC99:proceedings",
note = "2nd Annual Workshop on Semiconductor Advances for Future Electronics. IEEE 10th Annual Workshop on Circuits, Systems and Signal Processing, Mierlo ; Conference date: 24-11-1999 Through 25-11-1999",
}