Versatile n-type profile engineering by controlling arsenic surface segregation in silicon RPCVD

M Popadic, F Sarubbi, TLM Scholtes, LK Nanver

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

1 Citation (Scopus)
Original languageUndefined/Unknown
Title of host publicationECS Transactions
Editors s.n
Place of PublicationOuro Preto, Brazil
PublisherElectrochemical Society
Pages393-399
Number of pages7
ISBN (Print)1-56677-512-4
Publication statusPublished - 2006
Event21st International Symposium on Microelectronics Technology and Devices - Ouro Preto, Brazil
Duration: 28 Aug 20061 Sept 2006

Publication series

Name
PublisherElectroChemical Society
Name
Volume4

Conference

Conference21st International Symposium on Microelectronics Technology and Devices
Period28/08/061/09/06

Keywords

  • Elektrotechniek
  • Techniek
  • conference contrib. refereed
  • Conf.proc. > 3 pag

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