Vertical SiC taper with a small angle fabricated by slope transfer method

Yu Xin*, Gregory Pandraud, Paddy J. French

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)
91 Downloads (Pure)


In this Letter, a slope transfer method to fabricate vertical waveguide couplers is proposed. This method utilises wet etched Si as a mask, and takes advantage of dry etching selectivity between Si and SiC, to successfully transfer the profile from the Si master into SiC. By adopting this method, a <2° slope is achieved. Such a taper can bring the coupling efficiency in SiC waveguides to 80% (around 1 dB loss) or better from around 10% (10 dB loss) without taper. It further increases the alignment tolerance at the same time, which ensures the successful development of a plug-and-play solution for optical sensing. This is the first reported taper made in SiC.

Original languageEnglish
Pages (from-to)661-663
Number of pages3
JournalElectronics Letters
Issue number11
Publication statusPublished - 2019


  • silicon compounds
  • optical waveguidess
  • etching
  • optical fabricationr
  • optical couplers
  • silicon
  • elemental semiconductors
  • integrated optics
  • wide band gap semiconductors


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